High quality interfaces of InAs-on-insulator field-effect transistors with ZrO2 gate dielectrics
نویسندگان
چکیده
transistors with ZrO2 gate dielectrics Kuniharu Takei, Rehan Kapadia, Hui Fang, E. Plis, Sanjay Krishna, and Ali Javey Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, USA Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA Berkeley Sensor and Actuator Center, University of California, Berkeley, California 94720, USA Electrical and Computer Engineering, University of New Mexico, Albuquerque, New Mexico 87106, USA
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